Enzymes resistant to photodamage
US9127259B2 · kind B2 · utility
48Cited by
12References
11Claims
0Family size
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Key dates
| Filing date | Mar 30, 2009 |
| Grant date | Sep 8, 2015 |
| Priority date | — |
| Expiry date | Jun 5, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC12P19/34
- WIPO fieldBiotechnology
- WIPO sectorChemistry
Abstract
Provided are compositions comprising modified DNA polymerases that exhibit improved photostability compared to the parental polymerases from which they were derived. Provided are methods for generating enzymes, such as DNA polymerases, with the aforementioned phenotype. Provided are methods of using polymerases with increased resistance to photodamage to make a DNA or to sequence a DNA template.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.