Magnetron sputtering coating device, a nano-multilayer film, and the preparation method thereof
US9127347B2 · kind B2 · utility
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3References
9Claims
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Key dates
| Filing date | May 10, 2013 |
| Grant date | Sep 8, 2015 |
| Priority date | — |
| Expiry date | Sep 4, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A magnetron sputtering coating device includes a deposition chamber, sputtering cathodes, a rotating stand within the deposition chamber, a support platform on the rotating stand, a first rotation system for driving the rotating stand to rotate around a central axis of the rotating stand, and a baffle fixed on the rotating stand. The sputtering cathodes are arranged around and perpendicular to the rotating stand.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.