Device and method for coating a substrate using CVD

US9127350B2 · kind B2 · utility

Assignees

• DIACCON GMBH · DE
• CemeCon AG · DE

Inventors

• Martin Rueffer · Amberg, DE
• Stefan Rosiwal · Bamberg, DE
• Christian Bareiss · Aachen, DE
• Walter Reichert · Wantage, US
• Oliver Lemmer · Aachen, DE
• Marc Perle · Forchheim, DE

Key dates

• Filing date: Nov 13, 2009
• Grant date: Sep 8, 2015
• Expiry date: Nov 15, 2032

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67098
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to a device for coating a substrate (14) using CVD, in particular for coating with diamond or silicon, wherein a heat conductor array comprising a plurality of elongated heat conductors (2) is provided in a housing (10), said heat conductors extending between a first (1) and a second electrode (8), wherein the heat conductors (2) are held individually tensioned by a tensioning device attached to one end thereof. For the purposes of improving the life of the heat conductors (2), the invention proposes that the tensioning device comprises a tilt arm (5) having a tensioning weight (G), the heat conductor (2) being attached to the first end (E1) of said tilt arm, and the second end thereof substantially being mounted pivotably about a horizontal axis (H).