Substrate processing apparatus
US9127355B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2012 |
| Grant date | Sep 8, 2015 |
| Priority date | — |
| Expiry date | May 5, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided is a substrate processing apparatus including an openable and closable lid and being capable of precisely controlling a gap between multiple shields. The substrate processing apparatus includes: an openable and closable lid provided on an opening of a chamber; a first shield provided on a surface of the lid at the chamber side and having an insertion hole; an insertion section fixed to the lid while inserted through the insertion hole, and configured to support the first shield in a manner movable within a predetermined distance; a restriction section provided on an end portion of the insertion section and configured to restrict the movement of the first shield; and biasing means configured to bias the first shield to a member provided inside the chamber when the lid is closed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.