Lamp with uniform illumination pattern
US9127828B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2013 |
| Grant date | Sep 8, 2015 |
| Priority date | — |
| Expiry date | Nov 7, 2033 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF21Y2115/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A lamp with uniform illumination pattern is used for continually illuminating an illuminated area and includes at least one light module. The at least one light module includes two light sources respectively having different light intensity and arranged orderly. Two extension lines of two optical axes of the two light sources have one crossover point. Light emitted from the light source with less light intensity illuminates the illuminated area which is closer to the light module, while light emitted from the light source with greater light intensity illuminates the illuminated area which is farther to the light module. Light emitted from the light source, which is father to the illuminated are, can make up the intensity losses of attenuation since light emitted from the light source which is father to the illuminated area have greater light intensity. As a result, the lamp has uniform illumination pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.