EUV excitation light source with a laser beam source and a beam guide device for manipulating the laser beam
US9129717B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2013 |
| Grant date | Sep 8, 2015 |
| Priority date | — |
| Expiry date | Apr 13, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2391
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An Extreme Ultra-Violet (EUV) excitation light source has a beam guide device for manipulating at least one laser beam is provided. The beam guide device comprises at least one beam splitter for generating at least two separated beams from at least one laser beam, at least one mirror or a lens for manipulating at least one of the separated beams, a superposition mirror for superposing the at least two separated beams, and a focusing appliance for generating a respective focus for each of the at least two separated beams. At least two focuses can be generated at one identical location or at two different locations by the beam guide device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.