Gas delivery system with constant overpressure relative to ambient to system with varying vacuum suction
US9132404B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 9, 2008 |
| Grant date | Sep 15, 2015 |
| Priority date | — |
| Expiry date | Aug 29, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/15
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A system operating in an environment having an ambient pressure, the system comprising: a reactor configured to combine a plasma stream, powder particles and conditioning fluid to alter the powder particles and form a mixture stream; a supply chamber coupled to the reactor; a suction generator configured to generate a suction force at the outlet of the reactor; a fluid supply module configured to supply the conditioning fluid at an original pressure; and a pressure regulation module configured to: receive the conditioning fluid from the fluid supply module, reduce the pressure of the conditioning fluid from the original pressure to a selected pressure relative to the ambient pressure regardless of any changes in the suction force at the outlet of the reactor, and supply the conditioning fluid at the selected pressure to the supply chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.