Patent · US Active

Microscope and microscopy method for space-resolved measurement of a predetermined structure, in particular a structure of a lithographic mask

US9134626B2 · kind B2 · utility

0Cited by

2References

25Claims

0Family size

Assignee

Carl Zeiss SMS Ltd. · IL

Inventors

Hans-Juergen Mann · Oberkochen, DE
Michael Totzeck · Schwäbisch Gmünd, DE
Norbert Kerwien · Mögglingen, DE

Key dates

Filing date	Nov 20, 2007
Grant date	Sep 15, 2015
Priority date	—
Expiry date	Jul 31, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/68
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microscope is provided for space-resolved measurement of a predetermined structure. The microscope includes a source of radiation, which emits electromagnetic radiation of a predetermined wavelength, an optical system, which irradiates the electromagnetic radiation onto the structure to be measured and images the structure, irradiated with the electromagnetic radiation, onto a detector. The optical system has two eigen polarization conditions, and the optical system includes a polarization module by which a polarization condition can be set for the electromagnetic radiation of the source of radiation, the polarization conditions corresponding to the eigen polarization conditions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.