Implant with a surface layer having a topographic modification
US9138512B2 · kind B2 · utility
5Cited by
0References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 25, 2011 |
| Grant date | Sep 22, 2015 |
| Priority date | — |
| Expiry date | Aug 28, 2031 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61L2400/18
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The present invention refers to an implant with a surface layer having a topographic modification. The topographic modification includes a line pattern with ridge and groove widths of 0.9 to 1.1 μm and a ridge height of more than 0.9 μm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.