Patent · US Active

Implant with a surface layer having a topographic modification

US9138512B2 · kind B2 · utility

5Cited by
0References
13Claims
0Family size

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Key dates

Filing dateAug 25, 2011
Grant dateSep 22, 2015
Priority date
Expiry dateAug 28, 2031

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA61L2400/18
  • WIPO fieldMedical technology
  • WIPO sectorInstruments

Abstract

The present invention refers to an implant with a surface layer having a topographic modification. The topographic modification includes a line pattern with ridge and groove widths of 0.9 to 1.1 μm and a ridge height of more than 0.9 μm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.