Methods, systems and devices for forming nanochannels
US9139426B2 · kind B2 · utility
6Cited by
2References
23Claims
0Family size
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Key dates
| Filing date | Sep 19, 2011 |
| Grant date | Sep 22, 2015 |
| Priority date | — |
| Expiry date | Mar 16, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24975
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods of forming at least one nanochannel include: (a) providing a substrate having a thick single or a thick multi-layer overlayer; (b) milling at least one channel through the overlayer into the substrate; then (c) removing the overlayer; and (d) forming at least one nanochannel in the substrate having an average width and depth dimension that is less than about 10 nm in response to the milling and removing steps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.