X-ray source with an immersion lens
US9142382B2 · kind B2 · utility
2Cited by
22References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 18, 2011 |
| Grant date | Sep 22, 2015 |
| Priority date | — |
| Expiry date | Mar 15, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J35/186
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An x-ray source is described. During operation of the x-ray source, an electron source emits a beam of electrons. This beam of electrons is focused to a spot on a target by a magnetic focusing lens. In particular, the magnetic focusing lens includes an immersion lens in which a peak in a magnitude of an associated magnetic field occurs proximate to a plane of the target. Moreover, in response to receiving the beam of focused electrons, the target provides a transmission source of x-rays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.