Patterning of OLED materials
US9142779B2 · kind B2 · utility
9Cited by
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6Claims
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Key dates
| Filing date | Aug 6, 2014 |
| Grant date | Sep 22, 2015 |
| Priority date | — |
| Expiry date | Aug 6, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K2102/103
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of making a patterned OLED layer or layers. The method uses a shadow mask having, for example, a free-standing silicon nitride membrane to pattern color emitter material with a feature size of less than 10 microns. The methods can be used, for example, in the manufacture of OLED microdisplays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.