X-ray analyzing apparatus and method
US9146204B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 6, 2012 |
| Grant date | Sep 29, 2015 |
| Priority date | — |
| Expiry date | Aug 6, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/076
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An X-ray analyzing apparatus is such that a diffraction pattern, in which the intensity of secondary X-rays (4) is associated with the angle of rotation of a sample (S), is stored; while the pattern is scanned by a line of the secondary X-rays (4) intensity in a direction of highness and lowness, points on the pattern having not higher intensity than the line are taken as candidate points; respective angles of rotation of the candidate points, when the maximum value of the difference in angle of rotation between the neighboring candidate points attains a predetermined angle, are stored; depending on coordinates of a point of measurement, the angle of rotation proximate to the coordinates is read out from the stored angles; and the sample (S) is set to the read out angle and the point of measurement is arranged within the field of view (V) of a detector (7).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.