Resist composition, resist pattern-forming method, and resist solvent
US9146466B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Apr 8, 2014 |
| Grant date | Sep 29, 2015 |
| Priority date | — |
| Expiry date | Apr 8, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.