Method for fabrication pattern of nano material
US9147791B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 10, 2014 |
| Grant date | Sep 29, 2015 |
| Priority date | — |
| Expiry date | Sep 10, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
The present invention provides a method for fabricating nano material pattern comprising the steps of forming a perfluorinated polymer pattern on top of the substrate (step 1); spreading a dispersion containing the dispersed nano material on the substrate patterned in step 1) (step 2); and eliminating the perfluorinated polymer pattern formed on the substrate of step 2) (step 3). The method for fabricating nano material pattern of the present invention has advantages over the conventional lift-off method for the fabrication of nano material pattern, which are easiness in eliminating the perfluorinated polymer pattern after forming the nano material pattern with it and no chance of damaging the substrate, suggesting that the method of the invention is excellent in fabricating an excellent nano material pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.