MEMS device and methods for manufacturing and using same
US9148075B2 · kind B2 · utility
0Cited by
6References
12Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 8, 2014 |
| Grant date | Sep 29, 2015 |
| Priority date | — |
| Expiry date | Sep 8, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2203/058
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A Micro Electro Mechanical Systems (MEMS) device includes a rotor having first rotor teeth and second rotor teeth formed in at least two layers of silicon-on-insulator (SOI) substrate. Each rotor tooth belonging to the first rotor teeth is formed in a first layer and each rotor tooth belonging of the second rotor teeth is formed in a second layer. A stator includes first stator teeth and second stator teeth formed in at least two layers of SOI substrate. Each stator tooth belonging to the first stator teeth is formed in a first layer and each stator tooth belonging to the second stator teeth is formed in a second layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.