Method and system for graphene formation
US9150418B2 · kind B2 · utility
2Cited by
1References
30Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 22, 2013 |
| Grant date | Oct 6, 2015 |
| Priority date | — |
| Expiry date | Mar 16, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/335
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for forming graphene includes providing a substrate and subjecting the substrate to a reduced pressure environment. The method also includes providing a carrier gas and a carbon source and exposing at least a portion of the substrate to the carrier gas and the carbon source. The method further includes performing a surface treatment process on the at least a portion of the substrate and converting a portion of the carbon source to graphene disposed on the at least a portion of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.