Patent · US Active

Dimensional measurement through a combination of photogrammetry and optical scattering

US9151607B2 · kind B2 · utility

31Cited by
1References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 31, 2011
Grant dateOct 6, 2015
Priority date
Expiry dateFeb 18, 2033

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01S17/89
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A system for determining the position and location of a module comprising: a module which includes an optical generator which generates an optical beam; a diffractive element placed in the path of the optical beam which generates an optical pattern; a reference length artifact placed in a location with close proximity to the optical pattern; and a plurality of digital cameras connected to a computer with photogrammetry software and a minimization algorithm installed on the computer; where the digital cameras are set up in different locations to take one or more digital images of the optical pattern, with at least one digital image including the reference length artifact; and where the digital images are downloaded onto the computer and processed by the photogrammetry software to generate optical coordinate data followed by the insertion of the optical coordinate data into the minimization algorithm to generate the position and location of the module.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.