Arc PVD plasma source and method of deposition of nanoimplanted coatings
US9153422B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 1, 2012 |
| Grant date | Oct 6, 2015 |
| Priority date | — |
| Expiry date | Jan 7, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3455
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates to a method and an apparatus for applying metallic, ceramic or composite thin film coatings onto parts, components and tools (e.g. gas turbine engine compressor blades or cutting tools) by a cathodic arc deposition technique. The method and the apparatus allows for a continually changing structure of the applied film by nanoimplanting atoms, molecules, compounds or other chemical species and structures of different materials thus coating a substrate during a single process. Furthermore, during the same process it allows for creating a coating with specific parameters as required. For instance: hardness, smoothness, corrosion resistance, erosion resistance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.