Extreme ultraviolet source with magnetic cusp plasma control
US9155178B1 · kind B1 · utility
1Cited by
19References
7Claims
0Family size
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Key dates
| Filing date | Jun 27, 2014 |
| Grant date | Oct 6, 2015 |
| Priority date | — |
| Expiry date | Jun 27, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/007
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low temperature plasma. The plasma is initially trapped in a symmetrical cusp magnetic field configuration with a low magnetic field barrier to radial motion. Plasma overflows in a full range of radial directions and is conducted by radial field lines to a large area annular array of beam dumps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.