Lavatory system
US9157223B2 · kind B2 · utility
15Cited by
9References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 8, 2013 |
| Grant date | Oct 13, 2015 |
| Priority date | — |
| Expiry date | Nov 4, 2033 |
Classification
- Technology area (CPC E)Fixed Constructions
- CPC primaryE03C1/24
- WIPO fieldCivil engineering
- WIPO sectorOther fields
Abstract
A lavatory system includes a basin configured to receive at least one faucet, the basin defining a primary drain passage and first and second overflow drain passages; and an overflow adapter configured to be mounted to a rear surface of the basin, the overflow adapter defining an adapter passage such that when the overflow adapter is mounted to the basin, fluid received by way of the first overflow drain passage is directed through the adapter passage between the overflow adapter and the rear surface of the basin and to the second overflow drain passage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.