Plasma polish for magnetic recording media
US9159353B2 · kind B2 · utility
2Cited by
9References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 2012 |
| Grant date | Oct 13, 2015 |
| Priority date | — |
| Expiry date | May 16, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/7264
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Fabrication methods for magnetic recording media that use a plasma polish are disclosed. For one exemplary method, a film of a magnetic recording medium is deposited, and a top surface of the film is polished utilizing a plasma formed by a noble gas to smoothen the top surface of the film. A subsequent layer is then deposited onto the polished top surface of the film. A top surface of the subsequent layer has a reduced roughness by being deposited on the polished top surface of the film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.