Patent · US Active

Paste for electron emission source, and electron emission source

US9159519B2 · kind B2 · utility

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7Claims
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Key dates

Filing dateAug 3, 2010
Grant dateOct 13, 2015
Priority date
Expiry dateOct 9, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24479
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Disclosed are: a paste for an electron emission source, which enables omission of an activation process and is capable of emitting electrons at a low voltage, while exhibiting excellent adhesion to a cathode substrate; and an electron emission source which uses the paste for an electron emission source. Specifically disclosed is an electron emission source which is produced by subjecting a paste for an electron emission source containing the components (A)-(C) described below to a heat treatment. The electron emission source has cracks and carbon nanotubes project from the surfaces of the cracks. (A) carbon nanotubes (B) glass powder (C) at least one substance selected from the group consisting of metal salts, metal hydroxides, organic metal compounds, metal complexes, silane coupling agents and titanium coupling agents.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.