Patent · US Active

Method for cutting a patch to be applied onto a curved substrate

US9162338B2 · kind B2 · utility

0Cited by

2References

15Claims

0Family size

Assignee

Essilor International (Compagnie Generale d'Optique) · FR

Inventors

Pascal Allione · Charenton-le-Pont, FR
Cedric Begon · Charenton-le-Pont, FR
Nicolas Lavillonniere · Charenton-le-Pont, FR
Agnes Ladous · Charenton-le-Pont, FR

Key dates

Filing date	Mar 15, 2010
Grant date	Oct 20, 2015
Priority date	—
Expiry date	Feb 19, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T83/04
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method cuts a patch to be applied onto a curved substrate and includes the preliminary calculation of curvilinear lengths on the substrate between a reference point and a peripheral edge of said substrate. The calculated lengths are applied to a planar film for making the patch, and then the patch is cut by connecting the ends of the applied lengths. The patch then precisely coincides with the edge of the substrate. Such a method is particularly useful for applying a functional film onto a spectacle lens, as a trimming of the lens after the film is assembled with the lens would degrade said film.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.