Patent · US Active

Pretreatment process for aluminum and high etch cleaner used therein

US9163315B2 · kind B2 · utility

0Cited by

3References

10Claims

0Family size

Assignee

Henkel AG & Co. KGaA · DE

Inventors

Edis Kapic · Lake Orion, US
Michael L. Sienkowski · Warren, US
Bruce H. Goodreau · Romeo, US
Sophie Cornen · Goldkronach, DE

Key dates

Filing date	Jun 25, 2012
Grant date	Oct 20, 2015
Priority date	—
Expiry date	Aug 17, 2032

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC11D2111/16
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

A high etch cleaner for aluminum and aluminum alloy substrates that leads to enhanced corrosion protective performance of a variety of anti-corrosion pretreatments. The cleaner comprises low levels of silicate of from 0 to 250 ppm, 50 to 500 ppm of at least one chelator, and has a pH of from 11.0 to 13.5. The cleaner may be used to etch from 0.5 to 4.0 grams per meter squared from substrates. Substrates treated with the cleaner and then coated with a variety of anti-corrosion pretreatments and outer coatings show enhanced corrosion resistance compared to substrates cleaned with standard cleaners that have low etch rates, high silicate levels and no chelating agents followed by anti-corrosion pretreatments and outer coatings.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.