Patent · US Active

Method for manufacturing a probe

US9164130B2 · kind B2 · utility

0Cited by

3References

17Claims

0Family size

Assignee

Kabushiki Kaisha Nihon Micronics · JP

Inventor

Mika Nasu · Tokyo, JP

Key dates

Filing date	Oct 21, 2013
Grant date	Oct 20, 2015
Priority date	—
Expiry date	Dec 13, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG01R1/06733
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method for manufacturing a probe, includes forming a recess on a sacrificial layer with a resist matching a plane pattern of the probe and a fixing tab connected to the probe, the recess exposing the sacrificial layer, which is on a baseboard, forming the probe and the fixing tab connected to the probe by depositing a probe material in the recess, and removing the resist, removing a portion of the sacrificial layer in an etching process. The portion of the sacrificial layer under the probe is fully removed, while the portion of the sacrificial layer under the fixing tab is left to provide support portions of the sacrificial layer under the fixing tab. Then the probe is removed from the baseboard.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.