Patterning via optical-saturable transitions
US9164369B2 · kind B2 · utility
1Cited by
1References
12Claims
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Key dates
| Filing date | Mar 30, 2010 |
| Grant date | Oct 20, 2015 |
| Priority date | — |
| Expiry date | Jun 4, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.