Polarization resistant solar cell design using an oxygen-rich interface layer
US9166071B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 24, 2009 |
| Grant date | Oct 20, 2015 |
| Priority date | — |
| Expiry date | Jan 12, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
A polarization resistant solar cell using an oxygen-rich interface layer is provided. The oxygen-rich interface layer may be comprised of SiOxNy, which may have a graded profile that varies between oxygen-rich proximate to the solar cell to nitrogen-rich distal to the solar cell. A silicon oxide passivation layer may be interposed between the solar cell and the SiOxNy graded dielectric layer. The graded SiOxNy dielectric layer may be replaced with a non-graded SiOxNy dielectric layer and a SiN AR coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.