Patent · US Active

Method of generating high quality hole, recess or well in substrate

US9168614B2 · kind B2 · utility

1Cited by

2References

14Claims

0Family size

Assignee

ASAHI GLASS CO., LTD. · JP

Inventors

Christian Schmidt · Erfurt, DE
Leander DITTMANN · Lausanne, CH
Adrien Chaize · Hauterive, CH
Svend Hoyer · Ecublens, CH

Key dates

Filing date	Aug 15, 2013
Grant date	Oct 27, 2015
Priority date	—
Expiry date	Aug 15, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/24273
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A method of generating a hole or well in an electrically insulating or semiconducting substrate, a hole or well in a substrate generated by this method, and an array of holes or wells in a substrate generated by the method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.