Photopolymerizable and photocleavable resins and low shrink and low stress composite compositions
US9169332B2 · kind B2 · utility
0Cited by
6References
7Claims
0Family size
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Key dates
| Filing date | Sep 14, 2009 |
| Grant date | Oct 27, 2015 |
| Priority date | — |
| Expiry date | Sep 14, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F222/1025
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
A photopolymerizable and photocleavable (P&P) resin monomer is derived from a reactive photoresponsible moiety via various linkages to form photopolymerizable monomers and/or oligomers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.