Patent · US Active

Preparation, purification and use of high-X diblock copolymers

US9169383B2 · kind B2 · utility

3Cited by

0References

7Claims

0Family size

Assignee

E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

William B. Farnham · Hockessin, US
Michael T. Sheehan · Port Aransas, US
Hoang Vi Tran · Wilmington, US

Key dates

Filing date	Feb 11, 2013
Grant date	Oct 27, 2015
Priority date	—
Expiry date	Feb 11, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/0002
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

This invention relates to the preparation and purification of high-X (“chi”) diblock copolymers. Such copolymers contain two segments (“blocks”) of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.