Data validation and classification in optical analysis systems
US9170154B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 26, 2007 |
| Grant date | Oct 27, 2015 |
| Priority date | — |
| Expiry date | May 7, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/129
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of classifying information in an optical analysis system includes obtaining calibration data defining a plurality of data points, each data point representing values for two or more detectors when sampling a material used to construct a multivariate optical element. Based on the calibration data, one or more validation models can be developed to indicate one or more ranges of expected results. Validation data comprising the models can be used to compare data points representing values for two or more detectors when performing a measurement of a material to determine if the data points fall within an expected range. Classification data can be generated based on the comparison and, in some embodiments, one or more indicators, such as a confidence level in a measurement, can be provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.