Method and apparatus for producing a super-magnified wide-field image
US9170414B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 27, 2013 |
| Grant date | Oct 27, 2015 |
| Priority date | — |
| Expiry date | Jul 12, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B23/2446
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A wide-field optical microscope and method capable of resolving images down to 0.1 {acute over (Å)} with a magnification range in excess of 250 million power includes an objective having a primary and a secondary element. A sample is held so that the area of interest is at a location that is closer to the primary element than the focal length of the primary element. The primary element collects and collimates light reflected from the sample. The secondary element then focuses the collimated light onto a pinhole aperture, which blocks all light rays that were not parallel, thus producing a non-focused reflected pattern. The non-focused reflected pattern passes through a field stop and is then magnified by one or more negative optical elements and additional field stops to produce an enlarged pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.