Method and apparatus for irradiating a semi-conductor wafer with ultraviolet light
US9171747B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Mar 18, 2014 |
| Grant date | Oct 27, 2015 |
| Priority date | — |
| Expiry date | Mar 18, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J65/044
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for generating ultraviolet light and irradiating a 450 mm diameter semi-conductor wafer. The apparatus includes a plenum and an array of nine RF irradiator units coupled with the plenum. Each irradiator unit includes a plasma lamp bulb and an RF generator operable to generate a radiation energy field to excite the plasma lamp bulb and emit the ultraviolet light. The nine irradiator units are arranged in three rows with three of the irradiator units in each row.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.