Method and device for spatially periodic modification of a substrate surface
US9174385B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 12, 2011 |
| Grant date | Nov 3, 2015 |
| Priority date | — |
| Expiry date | Jul 31, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2103/50
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The invention relates to a method and a device for modifying in a spatially periodic manner at least in some regions a surface of a substrate (24), said surface being disposed on a sample plane (P) for which end different regions (211, 221, 231, 232) of the substrate surface are acted upon successively with a spatially periodic illumination pattern of an energy density above a processing threshold of the substrate surface, where the illumination pattern is generated by diffraction of an input beam (10) and superimposition of resulting, diffracted sub-beams (12, 14) by means of a grid interferometer (100), and where, in order to select the substrate surface region to be illuminated in each case (211, 221, 231, 232), the input beam (10) is deviated by means of a beam-deviating unit (16) arranged upstream of the grid interferometer (100).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.