Method for fabricating two dimensional nanostructured tungsten carbide
US9175387B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 21, 2013 |
| Grant date | Nov 3, 2015 |
| Priority date | — |
| Expiry date | May 21, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4488
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
2-dimensional nanostructured tungsten carbide which is obtained by control of the alignment of nanostructure during growth of tungsten carbide through control of the degree of supersaturation and a method for fabricating same are disclosed. The method for fabricating 2-dimensional nanostructured tungsten carbide employs a chemical vapor deposition process wherein a hydrogen plasma is applied to prepare 2-dimensional nanostructured tungsten carbide vertically aligned on a nanocrystalline diamond film. The chemical vapor deposition process wherein the hydrogen plasma is applied includes: disposing a substrate with the nanocrystalline diamond film formed thereon on an anode in a chamber, disposing a surface-carburized tungsten cathode above and at a distance from the substrate, and applying the hydrogen plasma into the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.