Pattern transfer method and apparatus
US9176376B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 2, 2011 |
| Grant date | Nov 3, 2015 |
| Priority date | — |
| Expiry date | Aug 31, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of performing pattern transfer includes the steps of: applying liquid to a substrate, while performing relative movement of the substrate and a liquid ejection head having a plurality of nozzles, by performing ejection and deposition of a plurality of droplets of the liquid from the nozzles onto the substrate in a state where a shape of each of the droplets upon the deposition is not a single circular shape and each of the droplets does not combine with adjacent another of the droplets on the substrate; and curing the liquid that has been applied to the substrate in the applying step while pressing a pattern forming surface of a stamper having a prescribed projection-recess pattern against the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.