Photolithographic patterning of polymeric materials
US9176384B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2011 |
| Grant date | Nov 3, 2015 |
| Priority date | — |
| Expiry date | Dec 9, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31507
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention. The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.