Patent · US Active

Method to make interferometric taper waveguide for HAMR light delivery

US9183854B2 · kind B2 · utility

1Cited by
596References
9Claims
0Family size

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Key dates

Filing dateJun 13, 2014
Grant dateNov 10, 2015
Priority date
Expiry dateJun 13, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG11B2005/0021
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for making an interferometric taper waveguide (I-TWG) with high critical dimension uniformity and small line edge roughness for a heat assisted magnetic recording (HAMR) head, wherein the method includes creating an I-TWG film stack with two hard mask layers on top of an I-TWG core layer sandwiched between two cladding layers, defining a photoresist pattern over the I-TWG film stack using deep ultraviolet lithography, transferring the pattern to the first hard mask layer using reactive ion etching (RIE), forming a temporary I-TWG pattern on the second hard mask layer using RIE, transferring the temporary pattern to the I-TWG core using RIE, refilling the cladding layer, and planarizing using chemical mechanical planarization (CMP).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.