Patent · US Active

Diffusion barrier coated substrates and methods of making the same

US9183973B2 · kind B2 · utility

1Cited by
7References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 29, 2013
Grant dateNov 10, 2015
Priority date
Expiry dateJun 2, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D30/6755
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Devices on a diffusion barrier coated metal substrates, and methods of making the same are disclosed. The devices include a metal substrate, a diffusion barrier layer on the metal substrate, one or more insulator layers on the diffusion barrier layer, and an antenna and/or inductor on the one or more insulator layer(s). The method includes forming a diffusion barrier layer on the metal substrate, forming one or more insulator layers on the diffusion barrier layer; and forming an antenna and/or inductor on an uppermost one of the insulator layer(s). The antenna and/or inductor is electrically connected to at least one of the diffusion barrier layer and/or the metal substrate. Such diffusion barrier coated substrates prevent diffusion of metal atoms from the metal substrate into device layers formed thereon.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.