Plasma equipment and methods of using the same
US9184031B2 · kind B2 · utility
0Cited by
2References
6Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 16, 2012 |
| Grant date | Nov 10, 2015 |
| Priority date | — |
| Expiry date | Jun 5, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32972
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Plasma equipments are provided. The plasma equipment includes a chamber in which a plasma reaction occurs, a detector outputting a spectrum signal in response to light generated from the plasma reaction, and a plasma monitoring module determining whether the spectrum signal includes an arcing signal or a hunting signal. Related methods are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.