Patent · US Active

Embedded tungsten resistor

US9184226B2 · kind B2 · utility

2Cited by
0References
10Claims
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Key dates

Filing dateAug 15, 2012
Grant dateNov 10, 2015
Priority date
Expiry dateAug 7, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/811

Abstract

A high TCR tungsten resistor on a reverse biased Schottky diode. A high TCR tungsten resistor on an unsilicided polysilicon platform geometry. A high TCR tungsten resistor between two parallel polysilicon leads on remaining contact etch stop dielectric. A high TCR tungsten resistor embedded in a intermetal dielectric layer above a lower interconnect layer and below an upper interconnect layer. A method of forming a high TCR tungsten resistor on a reverse biased Schottky diode. A method of forming high TCR tungsten resistor on an unsilicided polysilicon platform geometry. A method of forming high TCR tungsten resistor between two parallel polysilicon leads on remaining contact etch stop dielectric. A method of forming high TCR tungsten resistor embedded in a inter metal dielectric layer above a lower interconnect layer and below an upper interconnect layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.