Laser micro/nano processing system and method
US9187318B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2011 |
| Grant date | Nov 17, 2015 |
| Priority date | — |
| Expiry date | Oct 8, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02107
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A laser micro/nano processing system (100, 200, 300, 400) comprises: a laser light source used to provide a first laser beam having a first wavelength and a second laser beam having a second wavelength different from the first wavelength, with the pulse width of the first laser beam being in the range from a nanosecond to a femtosecond; an optical focusing assembly used to focus the first laser beam and the second laser beam to the same focal point; and a micro mobile platform (21) controlled by a computer. Also disclosed are a method for micro/nano-processing photosensitive materials with a laser and a method for fabricating a device with a micro/nano structure using laser two-photon direct writing technology. In the system and methods, spatial and temporal overlapping of two laser beams is utilized, so as to obtain a micro/nano structure with a processing resolution higher than that of a single laser beam, using an average power lower than that of a single laser beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.