Rinsing agent, and method for production of hard disk substrate
US9187718B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 19, 2011 |
| Grant date | Nov 17, 2015 |
| Priority date | — |
| Expiry date | Jan 10, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/20
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Provided are a rinsing agent to produce a hard disk substrate free from remaining abrasive grains as well as a pit defect on the surface thereof and a method for production of a hard disk substrate using such a rinsing agent. A rinsing agent of the present invention is rinsing solution containing colloidal silica as abrasive grains. Letting that the colloidal silica abrasive grains have a concentration C and an average grain size R (C and R are represented in weight % and nm, respectively), the concentration C and the average grain size R of the colloidal silica abrasive grains have a relation matching the following Expression (1):12.2C+18.2 (1).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.