System and method for compensating for second order diffraction in spectrometer measurements
US9188486B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2014 |
| Grant date | Nov 17, 2015 |
| Priority date | — |
| Expiry date | Aug 11, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2003/425
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention concerns a system and method for identifying and implementing a correction to spectrometer measurements in order to compensate for errors in the measurement values due to second order diffracted light. The present invention in one configuration, measures light reflectance percentages across the same wavelength range for at least one calibration target. From these measurements the portion of the reflectance values resulting from second order diffracted light is identified and corrected for, thereby generating a compensated measurement of the reflectance values of a sample. These compensated values are then provided to a user.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.