Photopatternable materials and related electronic devices and methods
US9190493B2 · kind B2 · utility
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4References
15Claims
0Family size
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Key dates
| Filing date | Jul 15, 2014 |
| Grant date | Nov 17, 2015 |
| Priority date | — |
| Expiry date | Jul 15, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.