Apparatus and method for inspecting crystallization
US9194815B2 · kind B2 · utility
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9Claims
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Key dates
| Filing date | Jun 19, 2013 |
| Grant date | Nov 24, 2015 |
| Priority date | — |
| Expiry date | Mar 1, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for inspecting crystallization includes a substrate including a semiconductor layer, the semiconductor layer includes a plurality of crystallized regions separated from each other; a stage configured to change a position of the substrate, the substrate being seated thereon; a photographing unit configured to acquire image data regarding the semiconductor layer; an inspection unit configured to obtain inspection data regarding the semiconductor layer; and a control unit configured to output change data regarding a change in the position of the substrate according to the image data acquired by the photographing unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.