Mask plate and exposing method
US9195143B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2013 |
| Grant date | Nov 24, 2015 |
| Priority date | — |
| Expiry date | Jan 1, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask plate comprises a light transmitting region; a light absorbing region; and a light reflecting region provided in the light absorbing region on one side of the mask plate. An exposing method using the mask plate comprises placing a first substrate coated with a first photosensitive resist layer under and parallel to the mask plate; having first light vertically strike on an upper surface of the mask plate from above, pass through the light transmitting region of the mask plate, and strike on the first photosensitive resist layer; placing a second substrate coated with a second photosensitive resist layer under and parallel to the mask plate; and having second light reflected by the lens device onto the surface of the mask plate where the light reflecting region is provided, then reflected by the light reflecting region and strike on the second photosensitive resist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.