Patent · US Active

Method for insulating nanowires or mircowires

US9196783B2 · kind B2 · utility

2Cited by
2References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 23, 2013
Grant dateNov 24, 2015
Priority date
Expiry dateJan 23, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H29/14
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A method for producing a microelectronic device including a plurality of light emitting diodes each including a wire of nanometric or micrometric size, the method including: growing the nanowires from a growth substrate; forming at least one dielectric layer on a transfer substrate distinct from the growth substrate; and penetration by the nanowires in the dielectric layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.