Patent · US Active

Passivation composition and process

US9200372B2 · kind B2 · utility

0Cited by

25References

25Claims

0Family size

Assignee

Fujifilm Electronic Materials U.S.A., Inc. · US

Inventors

William A. Wojtczak · Santa Clara, US
Bing Du · Gilbert, US
Tomonori Takahashi · Chita, JP

Key dates

Filing date	Oct 22, 2012
Grant date	Dec 1, 2015
Priority date	—
Expiry date	Apr 29, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/28518
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

This disclosure relates to a passivation composition containing at least one sulfonic acid, at least one compound containing a nitrate or nitrosyl ion, and water. The passivation composition is substantially free of a halide ion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.